2017, ISBN: 149396674X

Titel: Scanning Electron Microscopy and X-Ray Microanalysis | Medium: Buch | Autor: Joseph Go*dstein (u. a.) | Einband: Gebunden | Inhalt: XXIII / 550 S. / 137 s/w Illustr. / 409 farbige … More...

Titel: Scanning Electron Microscopy and X-Ray Microanalysis | Medium: Buch | Autor: Joseph Go*dstein (u. a.) | Einband: Gebunden | Inhalt: XXIII / 550 S. / 137 s/w Illustr. / 409 farbige Illustr. / 348 farbige Tab. / With online files/update. | Ausstattung / Beilage: Book w. online files / update | Auflage: 4th edition | Sprache: Englisch | Seiten: 550 | Abbildungen: 86 schwarz-weiße und 348 farbige Abbildungen, Bibliographie | Maße: 285 x 215 x 35 mm | Erschienen: 18.11.2017 | Anbieter: preigu. Scanning Electron Microscopy and X-Ray Microanalysis Buch von Joseph Go*dstein (u. a.) Details Autor: Joseph Go*dstein, Dale E. Newbury, David C. Joy, Joseph R. Michael, Nicholas W. M. Ritchie und John Henry J. ScottEAN: 9781493966745Einband: GebundenInhalt: XXIII / 550 S. / 137 s/w Illustr. / 409 farbige Illustr. / 348 farbige Tab. / With online files/update.Ausstattung / Beilage: Book w. online files / updateAuflage: 4th editionSprache: EnglischSeiten: 550Abbildungen: 86 schwarz-weiße und 348 farbige Abbildungen, BibliographieMaße: 285 x 215 x 35 mmErschienen: 18.11.2017Schlagworte: Maschinenbau / Fertigungstechnik / Spektroskopie / Spektrochemie / Massenspektrometrie / Technik / Mikroskopie / Arbeitsstoff / Material / Werkstoff / Biowissenschaften / Life Sciences / TECHNOLOGY & ENGINEERING / Materials Science / Wissenschaftliche Standards / Normung usw / Wissenschaftliche Ausstattung / Experimente und Techniken / Werkstoffprüfung / allgemein / Verstehen Beschreibung This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography and focused ion beams. Students and academic researchers will find the text to be an authoritative and scholarly resource, while SEM operators and a diversity of practitioners - engineers, technicians, physical and biological scientists, clinicians, and technical managers - will find that every chapter has been overhauled to meet the more practical needs of the technologist and working professional. In a break with the past, this Fourth Edition de-emphasizes the design and physical operating basis of the instrumentation, including the electron sources, lenses, detectors, etc. In the modern SEM, many of the low level instrument parameters are now controlled and optimized by the microscope's software, and user access is restricted. Although the software control system provides efficient and reproducible microscopy and microanalysis, the user must understand the parameter space wherein choices are made to achieve effective andmeaningful microscopy, microanalysis, and micro-crystallography. Therefore, special emphasis is placed on beam energy, beam current, electron detector characteristics and controls, and ancillary techniques such as energy dispersive x-ray spectrometry (EDS) and electron backscatter diffraction (EBSD).With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a "dual beam" platform incorporating both electron and ion columns allows precision modification of the specimen by focused ion beam milling. New coverage in the Fourth Edition inclu*es the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process. This book helps you to achieve this goal.Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managersEmphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful resultsProvides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurementsMakes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation.Inclu*es case studies to illustrate practical problem solvingCovers Helium ion scanning microscopyOrganized into relatively self-contained modules - no need to "read it all" to understand a topicInclu*es an online supplement-an extensive "Database of Electronic-Solid Interactions"-which can be accessed on SpringerLink, in Chapter 3 Kurzbeschreibung Titel: Scanning Electron Microscopy and X-Ray Microanalysis | Medium: Buch | Autor: Joseph Go*dstein (u. a.) | Einband: Gebunden | Inhalt: XXIII / 550 S. / 137 s/w Illustr. / 409 farbige Illustr. / 348 farbige Tab. / With online files/update. | Ausstattung / Beilage: Book w. online files / update | Auflage: 4th edition | Sprache: Englisch | Seiten: 550 | Abbildungen: 86 schwarz-weiße und 348 farbige Abbildungen, Bibliographie | Maße: 285 x 215 x 35 mm | Erschienen: 18.11.2017 | Anbieter: preigu Interessiert Sie vielleicht auch BücherHörbücherFilme & SerienGesellschaftsspieleSonderaktionen Das erwartet Sie bei preigu Schnelle & professionelle Abwicklung Kompetenter & unkomplizierter Service Rechnung bequem per Email Versand per Deutsche Post oder DHL Interne preigu Artikelnummer: 110-802-009 , Neu, Festpreisangebot, [LT: FixedPrice], Publikationsname: Scanning Electron Microscopy and X-Ray Microanalysis, Marke: Springer US, Springer-Verlag GmbH, Hersteller: Springer US, Springer-Verlag GmbH, Format: Gebundene Ausgabe, Genre: Technik, Ausgabe: 4th edition, Schlagworte: Maschinenbau, Fertigungstechnik, Spektroskopie, Spektrochemie, Ma, Zielgruppe: Erwachsene, Springer US, Springer-Verlag GmbH, 2017<

2017, ISBN: 9781493966745

Gebunden, 550 Seiten, 86 schwarz-weiße und 348 farbige Abbildungen, Bibliographie, 285mm x 215mm x 35mm, Sprache(n): eng Realigns the text with the needs of a diverse audience from resea… More...

Gebunden, 550 Seiten, 86 schwarz-weiße und 348 farbige Abbildungen, Bibliographie, 285mm x 215mm x 35mm, Sprache(n): eng Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managersEmphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful resultsProvides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurementsMakes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulationIncludes case studies to illustrate practical problem solvingCovers Helium ion scanning microscopyOrganized into relatively self-contained modules - no need to "read it all" to understand a topicThis thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography and focused ion beams. Students and academic researchers will find the text to be an authoritative and scholarly resource, while SEM operators and a diversity of practitioners - engineers, technicians, physical and biological scientists, clinicians, and technical managers - will find that every chapter has been overhauled to meet the more practical needs of the technologist and working professional. In a break with the past, this Fourth Edition de-emphasizes the design and physical operating basis of the instrumentation, including the electron sources, lenses, detectors, etc. In the modern SEM, many of the low level instrument parameters are now controlled andoptimized by the microscope's software, and user access is restricted. Although the software control system provides efficient and reproducible microscopy and microanalysis, the user must understand the parameter space wherein choices are made to achieve effective andmeaningful microscopy, microanalysis, and micro-crystallography. Therefore, special emphasis is placed on beam energy, beam current, electron detector characteristics and controls, and ancillary techniques such as energy dispersive x-ray spectrometry (EDS) and electron backscatter diffraction (EBSD).With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a "dual beam" platform incorporating both electron and ion columns allows precision modification of the specimen by focused ion beam milling. New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process. This book helps you to achieve this goal.Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managersEmphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful resultsProvides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurementsMakes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation.Includes case studies to illustrate practical problem solvingCovers Helium ion scanning microscopyOrganized into relatively self-contained modules - no need to "read it all" to understand a topicIncludes an online supplement-an extensive "Database of Electronic-Solid Interactions"-which can be accessed on SpringerLink, in Chapter 3This text is written by a team of authors associated with SEM and X-ray Microanalysis Courses presented as part of the Lehigh University Microscopy Summer School. Several of the authors have participated in this activity for more than 30 years. Versandkostenfreie Lieferung EBSD, Electron backscatter diffraction, Environmental SEM, Focused ion beam, Ion beam microanalysis, Qualitative X-ray analysis, Quantitative X-ray analysis, SDD x-ray detectors, SEM textbook, Table top SEM, Variable pressure SEM, X-ray mapping, X-ray microanalysis book, X-ray spectral measurement, dual column instruments, Mikroskopie, Spektroskopie, Arbeitsstoff, Material, Werkstoff, Biowissenschaften, Life Sciences, [PU:Springer-Verlag GmbH]<

2017, ISBN: 149396674X

[EAN: 9781493966745], Neubuch, [SC: 0.0], [PU: Springer-Verlag Gmbh Nov 2017], MIKROSKOPIE; SPEKTROSKOPIE; ARBEITSSTOFF; MATERIAL; WERKSTOFF; BIOWISSENSCHAFTEN; LIFE SCIENCES; TECHNOLOGY … More...

[EAN: 9781493966745], Neubuch, [SC: 0.0], [PU: Springer-Verlag Gmbh Nov 2017], MIKROSKOPIE; SPEKTROSKOPIE; ARBEITSSTOFF; MATERIAL; WERKSTOFF; BIOWISSENSCHAFTEN; LIFE SCIENCES; TECHNOLOGY & ENGINEERING / MATERIALS SCIENCE; EBSD; ELECTRON BACKSCATTER DIFFRACTION; ENVIRONMENTAL SEM; FOCUSED ION BEAM; BEAM MICROANALYSIS; QUALITATIVE X-RAY ANALYSIS; QUANTITATIVE SDD DETECTORS; SEM TEXTBOOK; TABLE TOP VARIABLE PRESSURE MAPPING; MICROANALYSIS BOOK; SPECTRAL MEASUREMENT; DUAL COLUMN INSTRUMENTS, Druck auf Anfrage Neuware - Printed after ordering - This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography, and focused ion beams. Students and academic researchers will find the text to be an authoritative and scholarly resource, while SEM operators and a diversity of practitioners - engineers, technicians, physical and biological scientists, clinicians, and technical managers - will find that every chapter has been overhauled to meet the more practical needs of the technologist and working professional. In a break with the past, this Fourth Edition de-emphasizes the design and physical operating basis of the instrumentation, including the electron sources, lenses, detectors, etc. In the modern SEM, many of the low level instrument parameters are now controlled and optimized by the microscope's software, and user access is restricted. Although the software control system provides efficient and reproducible microscopy and microanalysis, the user must understand the parameter space wherein choices are made to achieve effective and meaningful microscopy, microanalysis, and micro-crystallography. Therefore, special emphasis is placed on beam energy, beam current, electron detector characteristics and controls, and ancillary techniques such as energy dispersive x-ray spectrometry (EDS) and electron backscatter diffraction (EBSD).With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a 'dual beam' platform incorporating both electron and ion columns allows precision modification of the specimen by focused ion beam milling. New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process. This book helps you to achieve this goal.Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managersEmphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful resultsProvides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurementsMakes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation.Includes case studies to illustrate practical problem solvingCovers Helium ion scanning microscopyOrganized into relatively self-contained modules - no need to 'read it all' to understand a topicIncludes, Books<

ISBN: 9781493966745

[ED: Hardcover], [PU: Springer / Springer New York / Springer, Berlin], This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive … More...

[ED: Hardcover], [PU: Springer / Springer New York / Springer, Berlin], This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography, and focused ion beams. Students and academic researchers will find the text to be an authoritative and scholarly resource, while SEM operators and a diversity of practitioners - engineers, technicians, physical and biological scientists, clinicians, and technical managers - will find that every chapter has been overhauled to meet the more practical needs of the technologist and working professional. In a break with the past, this Fourth Edition de-emphasizes the design and physical operating basis of the instrumentation, including the electron sources, lenses, detectors, etc. In the modern SEM, many of the low level instrument parameters are now controlled and optimized by the microscope's software, and user access is restricted. Although the software control system provides efficient and reproducible microscopy and microanalysis, the user must understand the parameter space wherein choices are made to achieve effective and meaningful microscopy, microanalysis, and micro-crystallography. Therefore, special emphasis is placed on beam energy, beam current, electron detector characteristics and controls, and ancillary techniques such as energy dispersive x-ray spectrometry (EDS) and electron backscatter diffraction (EBSD). With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a "dual beam" platform incorporating bothelectron and ion columns allows precision modification of the specimen by focused ion beam milling. New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process. This book helps you to achieve this goal.Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managers Emphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful results Provides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurements Makes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation. Includes case studies to illustrate practical problem solving Covers Helium ion scanning microscopy Organized into relatively self-contained modules - no need to "read it all" to understand a topic Includesan xxiii, 550 S. XXIII, 550 p. 546 illus., 409 illus. in color. With online files/update. 2 Versandfertig in 6-10 Tagen, DE, [SC: 0.00], Neuware, gewerbliches Angebot, Offene Rechnung (Vorkasse vorbehalten)<

2001, ISBN: 9781493966745

[ED: Buch], [PU: Springer-Verlag GmbH], Neuware - This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the fi… More...

[ED: Buch], [PU: Springer-Verlag GmbH], Neuware - This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography, and focused ion beams. Students and academic researchers will find the text to be an authoritative and scholarly resource, while SEM operators and a diversity of practitioners - engineers, technicians, physical and biological scientists, clinicians, and technical managers - will find that every chapter has been overhauled to meet the more practical needs of the technologist and working professional. In a break with the past, this Fourth Edition de-emphasizes the design and physical operating basis of the instrumentation, including the electron sources, lenses, detectors, etc. In the modern SEM, many of the low level instrument parameters are now controlled and optimized by the microscope's software, and user access is restricted. Although the software control system provides efficient and reproducible microscopy and microanalysis, the user must understand the parameter space wherein choices are made to achieve effective and meaningful microscopy, microanalysis, and micro-crystallography. Therefore, special emphasis is placed on beam energy, beam current, electron detector characteristics and controls, and ancillary techniques such as energy dispersive x-ray spectrometry (EDS) and electron backscatter diffraction (EBSD).With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a 'dual beam' platform incorporating both electron and ion columns allows precision modification of the specimen by focused ion beam milling. New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process. This book helps you to achieve this goal.Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managersEmphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful resultsProvides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurementsMakes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation.Includes case studies to illustrate practical problem solvingCovers Helium ion scanning microscopyOrganized into relatively self-contained modules - no need to 'read it all' to understand a topicIncludes- Besorgungstitel - vorauss. Lieferzeit 3-5 Tage., DE, [SC: 0.00], Neuware, gewerbliches Angebot, 285x215x35 mm, 550, [GW: 1808g], Banküberweisung, PayPal, Offene Rechnung (Vorkasse vorbehalten)<