1995, ISBN: 0792395204
Ion implantation offers one of the best examples of a topic that starting from the basic research level has reached the high technology level within the framework of microelectronics. As … More...
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Ion Implantation: Basics to Device Fabrication / Emanuele Rimini / Buch / The Springer International Series in Engineering and Computer Science / HC runder Rücken kaschiert / XIII / Englisch / 1994 - hardcover
1994, ISBN: 9780792395201
[ED: Gebunden], [PU: Springer US], Ion implantation offers one of the best examples of a topic that starting from the basic research level has reached the high technology level within the… More...
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1994, ISBN: 9780792395201
Hard cover, New., Sewn binding. Cloth over boards. 393 p. Contains: Unspecified. The Springer International Engineering and Computer Science, 293., New York, NY, [PU: Springer]
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1994, ISBN: 0792395204
[EAN: 9780792395201], Nouveau livre, [SC: 14.15], [PU: Springer], Books
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Ion Implantation: Basics to Device Fabrication (the Springer International Series in Engineering and Computer Science) - hardcover
1994, ISBN: 9780792395201
Hardcover, Nouveau livre, As new., [PU: Springer]
alibris.co.uk |
1995, ISBN: 0792395204
Ion implantation offers one of the best examples of a topic that starting from the basic research level has reached the high technology level within the framework of microelectronics. As … More...
Rimini, Emanuele:
Ion Implantation: Basics to Device Fabrication / Emanuele Rimini / Buch / The Springer International Series in Engineering and Computer Science / HC runder Rücken kaschiert / XIII / Englisch / 1994 - hardcover1994, ISBN: 9780792395201
[ED: Gebunden], [PU: Springer US], Ion implantation offers one of the best examples of a topic that starting from the basic research level has reached the high technology level within the… More...
1994
ISBN: 9780792395201
Hard cover, New., Sewn binding. Cloth over boards. 393 p. Contains: Unspecified. The Springer International Engineering and Computer Science, 293., New York, NY, [PU: Springer]
1994, ISBN: 0792395204
[EAN: 9780792395201], Nouveau livre, [SC: 14.15], [PU: Springer], Books
Ion Implantation: Basics to Device Fabrication (the Springer International Series in Engineering and Computer Science) - hardcover
1994, ISBN: 9780792395201
Hardcover, Nouveau livre, As new., [PU: Springer]
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Details of the book - Ion Implantation: Basics to Device Fabrication
EAN (ISBN-13): 9780792395201
ISBN (ISBN-10): 0792395204
Hardcover
Paperback
Publishing year: 1994
Publisher: Springer
410 Pages
Weight: 0,771 kg
Language: eng/Englisch
Book in our database since 2008-03-18T10:06:10-04:00 (New York)
Detail page last modified on 2024-01-31T09:30:44-05:00 (New York)
ISBN/EAN: 9780792395201
ISBN - alternate spelling:
0-7923-9520-4, 978-0-7923-9520-1
Alternate spelling and related search-keywords:
Book author: rimini, emanuele
Book title: ion, basics, rimini, computer science
Information from Publisher
Author: Emanuele Rimini
Title: The Springer International Series in Engineering and Computer Science; Ion Implantation: Basics to Device Fabrication
Publisher: Springer; Springer US
393 Pages
Publishing year: 1994-12-31
New York; NY; US
Language: English
235,39 € (DE)
241,99 € (AT)
260,00 CHF (CH)
Available
XIII, 393 p.
BB; Hardcover, Softcover / Technik/Maschinenbau, Fertigungstechnik; Werkstoffprüfung; Verstehen; basic research; ion; material; radiation; semiconductor; silicon; Characterization and Analytical Technique; Inorganic Chemistry; Nuclear Physics; Anorganische Chemie; Atom- und Molekularphysik; EA; BC
1 Semiconductor Devices.- 1.1 Introduction.- 1.2 Semiconductor Physics.- 1.3 p-n Junction and Diode.- 1.4 Unipolar and Bipolar Transistors.- 1.5 Ion Implantation and Semiconductor Devices.- 1.6 Damage and Yield.- 1.7 Future Trend.- 2 Ion Implanters.- 2.1 Introduction.- 2.2 Ion Sources.- 2.3 High Energy Implanters.- 2.4 Magnetic Analyzer and Beam Transport.- 2.5 Energy Contamination.- 2.6 Scan System and Current Measurement.- 2.7 Wafer Cooling.- 2.8 Wafer Charging.- 2.9 Uniformity Control and Mapping.- 2.10 Contaminants and Yield.- 2.11 Plasma Immersion Ion Implantation.- 3 Range Distribution.- 3.1 Introduction.- 3.2 Elastic Stopping Power.- 3.3 Electronic Energy Loss.- 3.4 Depth Profile of Implanted Ions.- 3.5 Penetration Anomalies.- 3.6 Channeling Implants.- 3.7 Lateral Spreading.- 3.8 Simulation of Range Distribution.- 4 Radiation Damage.- 4.1 Introduction.- 4.2 Collision Cascade.- 4.3 Damage Distribution.- 4.4 Crystalline Defects.- 4.5 Primary Defects.- 4.6 Hot Implants.- 4.7 Ion Beam Induced Enhanced Crystallization.- 4.8 Ion Implantation into Localized Si Areas.- 5 Annealing and Secondary Defects.- 5.1 Introduction.- 5.2 Solid Phase Epitaxial Growth of Amorphous Silicon.- 5.3 Annealing of Low-Dose Heavy - Ion Implant.- 5.4 Regrowth of Amorphous Layer Under a Mask.- 5.5 Annealing of Heavily Disordered Regions.- 5.6 Rapid Thermal Processing.- 5.7 Impurity Diffusion During Annealing.- 5.8 Interaction of Impurities with Ion Implanted Defects.- 5.9 Defect Engineering.- 6 Analytical Techniques.- 6.1 Introduction.- 6.2 Secondary Ion Mass Spectrometry.- 6.3 Spreading Resistance Profilometry: One and Two Dimensional Analyses.- 6.4 Carrier and Mobility Profiles.- 6.5 Rutherford Backscattering and Channeling Effect.- 6.6 Transmission Electron Microscopy.- 7 Silicon Based Devices.- 7.1 Introduction.- 7.2 Threshold Voltage Control in MOSFET.- 7.3 Short Channel Effects.- 7.4 Shallow Junctions.- 7.5 Complementary MOS Devices and Technology.- 7.6 Lifetime Engineering in Power Devices.- 7.7 High Energy Implant Applications.- 7.8 High-Speed Bipolar Transistors.- 8 Ion Implantation in Compound Semi-Conductor and Buried Layer Synthesis.- 8.1 Introduction.- 8.2 Ion Implantation in GaAs.- 8.3 Ion Implantation in InP.- 8.4 Isolation of III-V Semiconductors.- 8.5 Isolation of Superlattice and Quantum Well Structures.- 8.6 Synthesis of Buried Dielectric.- 8.7 Devices in SOI Substrates.- 8.8 Buried Metal Layer Formation.- 8.9 Compound Semiconductor Based Devices.- Selected References.- References.More/other books that might be very similar to this book
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