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Microelectronic Applications Of Chemical Mechanical Planarization - Wiley
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Wiley:
Microelectronic Applications Of Chemical Mechanical Planarization - new book

2007, ISBN: 9780470180891

ID: 5576714

An authoritative, systematic, and comprehensive description of current CMP technology Chemical Mechanical Planarization (CMP) provides the greatest degree of planarization of any known technique. The current standard for integrated circuit (IC) planarization, CMP is playing an increasingly important role in other related applications such as microelectromechanical systems (MEMS) and computer. An authoritative, systematic, and comprehensive description of current CMP technology Chemical Mechanical Planarization (CMP) provides the greatest degree of planarization of any known technique. The current standard for integrated circuit (IC) planarization, CMP is playing an increasingly important role in other related applications such as microelectromechanical systems (MEMS) and computer hard drive manufacturing. This reference focuses on the chemical aspects of the technology and includes contributions from the foremost experts on specific applications. After a detailed overview of the fundamentals and basic science of CMP, Microelectronic Applications of Chemical Mechanical Planarization: * Provides in-depth coverage of a wide range of state-of-the-art technologies and applications * Presents information on new designs, capabilities, and emerging technologies, including topics like CMP with nanomaterials and 3D chips * Discusses different types of CMP tools, pads for IC CMP, modeling, and the applicability of tribometrology to various aspects of CMP * Covers nanotopography, CMP performance and defect profiles, CMP waste treatment, and the chemistry and colloidal properties of the slurries used in CMP * Provides a perspective on the opportunities and challenges of the next fifteen years Complete with case studies, this is a valuable, hands-on resource for professionals, including process engineers, equipment engineers, formulation chemists, IC manufacturers, and others. With systematic organization and questions at the end of each chapter to facilitate learning, it is an ideal introduction to CMP and an excellent text for students in advanced graduate courses that cover CMP or related semiconductor manufacturing processes. eBooks, , Microelectronic Applications Of Chemical Mechanical Planarization~~EBook~~9780470180891~~Yuzhuo Li, , Microelectronic Applications Of Chemical Mechanical Planarization, , 9780470180891, Wiley, 12/04/2007, , , , Wiley

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Microelectronic Applications of Chemical Mechanical Planarization - Jung H. Han
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Jung H. Han:
Microelectronic Applications of Chemical Mechanical Planarization - new book

ISBN: 9780470180891

ID: 9780470180891

An authoritative, systematic, and comprehensive description of current CMP technology Chemical Mechanical Planarization (CMP) provides the greatest degree of planarization of any known technique. The current standard for integrated circuit (IC) planarization, CMP is playing an increasingly important role in other related applications such as microelectromechanical systems (MEMS) and computer hard drive manufacturing. This reference focuses on the chemical aspects of the technology and includes contributions from the foremost experts on specific applications. After a detailed overview of the fundamentals and basic science of CMP, Microelectronic Applications of Chemical Mechanical Planarization: * Provides in-depth coverage of a wide range of state-of-the-art technologies and applications * Presents information on new designs, capabilities, and emerging technologies, including topics like CMP with nanomaterials and 3D chips * Discusses different types of CMP tools, pads for IC CMP, modeling, and the applicability of tribometrology to various aspects of CMP * Covers nanotopography, CMP performance and defect profiles, CMP waste treatment, and the chemistry and colloidal properties of the slurries used in CMP * Provides a perspective on the opportunities and challenges of the next fifteen years Complete with case studies, this is a valuable, hands-on resource for professionals, including process engineers, equipment engineers, formulation chemists, IC manufacturers, and others. With systematic organization and questions at the end of each chapter to facilitate learning, it is an ideal introduction to CMP and an excellent text for students in advanced graduate courses that cover CMP or related semiconductor manufacturing processes.; PDF \ Jung H. Han; Scientific, Technical and Medical > Biochemical engineering, Wiley

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Microelectronic Applications of Chemical Mechanical Planarization (eBook, PDF) - Li, Yuzhuo
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Li, Yuzhuo:
Microelectronic Applications of Chemical Mechanical Planarization (eBook, PDF) - new book

ISBN: 9780470180891

ID: 12cd29bbe4902aedd90c80bc0970ee5f

An authoritative, systematic, and comprehensive description of current CMP technologyChemical Mechanical Planarization (CMP) provides the greatest degree of planarization of any known technique. The current standard for integrated circuit (IC) planarization, CMP is playing an increasingly important role in other related applications such as microelectromechanical systems (MEMS) and computer hard drive manufacturing. This reference focuses on the chemical aspects of the technology and includes contributions from the foremost experts on specific applications. After a detailed overview of the fundamentals and basic science of CMP, Microelectronic Applications of Chemical Mechanical Planarization:*Provides in-depth coverage of a wide range of state-of-the-art technologies and applications*Presents information on new designs, capabilities, and emerging technologies, including topics like CMP with nanomaterials and 3D chips*Discusses different types of CMP tools, pads for IC CMP, modeling, and the applicability of tribometrology to various aspects of CMP*Covers nanotopography, CMP performance and defect profiles, CMP waste treatment, and the chemistry and colloidal properties of the slurries used in CMP*Provides a perspective on the opportunities and challenges of the next fifteen yearsComplete with case studies, this is a valuable, hands-on resource for professionals, including process engineers, equipment engineers, formulation chemists, IC manufacturers, and others. With systematic organization and questions at the end of each chapter to facilitate learning, it is an ideal introduction to CMP and an excellent text for students in advanced graduate courses that cover CMP or related semiconductor manufacturing processes. E-Book, [PU: Wiley]

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Microelectronic Applications of Chemical Mechanical Planarization - Yuzhuo Li
book is out-of-stock
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Yuzhuo Li:
Microelectronic Applications of Chemical Mechanical Planarization - new book

ISBN: 9780470180891

ID: 9780470180891

An authoritative, systematic, and comprehensive description ofcurrent CMP technology Microelectronic Applications of Chemical Mechanical Planarization: An authoritative, systematic, and comprehensive description ofcurrent CMP technology Chemical Engineering Chemische Verfahrenstechnik Components & Devices Electrical & Electronics Engineering Elektrotechnik u. Elektronik Halbleiter Komponenten u. Bauelemente Mikroelektronik Semiconductors, John Wiley & Sons

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Microelectronic Applications of Chemical Mechanical Planarization
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Microelectronic Applications of Chemical Mechanical Planarization - new book

ISBN: 9780470180891

ID: 723128192

eBooks > Belletristik > Erzählungen, [PU: Wiley]

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